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本文应用X射线衍射、金相和电子探针等方法研究了Ti和Ti-6Al-4V合金在750—920℃温度范围离子氮化后的氮化层和基体组织结构。在Ti-6Al-4V合金的氮化层中,形成一层富Al并固溶氮的α′-Ti(Al,N)相,它介于氮化层和基体之间,成为一个阻挡层,阻止氮向基体扩散,改变了Ti-6Al-4V合金离子氮化的行为。此外还发现,经离子氮化后,两种材料基体的择尤取向均发生显著变化。在板面法线方向的倒极图上,择尤取向(0001)变为(01(?)0)和(21(?)1),且试样中心比表面的取向更为集中,这可能是离子氮化工艺促成的现象。
In this paper, the nitride layer and matrix structure of Ti and Ti-6Al-4V alloy after ion nitriding in the temperature range of 750-920 ℃ were studied by X-ray diffraction, metallography and electron probe. In the nitride layer of the Ti-6Al-4V alloy, an Al-rich and solid-solution nitrogen-doped α’-Ti (Al, N) phase is formed between the nitride layer and the substrate to form a barrier layer, Prevent nitrogen from diffusing into the matrix, and change the ion nitriding of Ti-6Al-4V alloy. In addition, it was also found that the selective orientation of the two materials changed significantly after ion nitriding. In the normal direction of the plate, the preferred orientation (0001) becomes (01 (?) 0) and (21 (?) 1) and the center of the sample is more concentrated than the surface, Ion nitriding process to promote the phenomenon.