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大面积纳米压印是一种高效、低成本和批量化制造大面积微纳米结构的方法,已经被看作最具有工业化应用前景的微纳米制造方法之一.脱模是当前大面积纳米压印所面临的最大挑战性问题,是制约大尺寸晶圆级纳米压印进入工业化应用最大的瓶颈.“揭开”式脱模已经被认为是实现大面积纳米压印最为有效的一种脱模方法,本文开展了大面积纳米压印揭开式脱模理论建模和数值模拟的研究.基于应变能法,并结合脱模过程中能量的守恒,建立了“揭开”式脱模预估脱模力理论模型.以光栅图形垂直式脱模为例,建立了目前工业界广泛采用的气体辅助揭开式脱模在脱模过程中所需气压脱模力理论模型.利用ABAQUS工程模拟软件,揭示了模具材料特性、特征图形几何参数对于“揭开”式脱模影响规律.该研究为大面积纳米压印工艺奠定重要理论基础,并为晶圆级纳米压印工艺优化和压印装备开发与性能的改进提供理论基础和方向性指导.
Large-area nanoimprinting is a high-efficiency, low-cost and batch method of manufacturing large-area micro-nano structure, which has been regarded as one of the most promising micro / nano fabrication methods for industrial application.Demolition is the current large area nanoimprint The biggest challenge is to limit the biggest bottleneck in the industrial application of large-size wafer-level nanoimprint. “Unveiling” has been considered the most effective way to achieve large-area nanoimprint In this paper, the theoretical modeling and numerical simulation of large area nanoimprinting debarking demolding are carried out.According to the strain energy method and the conservation of energy during the demolding process, we establish the “open” The theoretical model of mold release force prediction is established.A theoretical model of gas stripping force required by the gas-assisted uncovering demolding, which is widely used in the industry, is established by taking the vertical stripping of grating pattern as an example.Using ABAQUS Engineering simulation software reveals the influence of mold material characteristics and geometrical parameters of the figure on the “unfolding” demolding.The research lays an important theoretical foundation for the large area nanoimprinting process and provides a theoretical basis for the wafer-level nanoimprint process And improve the development and performance of stamping equipment to provide a theoretical basis for guidance and direction.