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提出了离子束刻蚀制备微透镜阵列的工艺原理；研究了球面型光致抗蚀剂掩膜的形成过程以及硅微透镜离子束刻蚀的实验条件．表面探针测量及扫描电子显微镜（ＳＥＭ）实验证明了该技术可在较低的衬底温度下（低于２００℃）有效地制备出球面型微透镜，并用表面探针测量确定了硅微透镜的尺寸．
The principle of ion beam etching for the fabrication of microlens arrays was proposed. The formation process of the spherical photoresist mask and the experimental conditions of the silicon microlens ion beam etching were studied. Surface probe measurement and scanning electron microscopy (SEM) experiments show that the technology can be effectively prepared at a low substrate temperature (less than 200 ℃) spherical microlens, and with the surface probe to determine the silicon microlens size of.