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A micro amperometric immunosensor with the sensitive area of only 1mm~2 was fabricated on silicon using the technique of Micro-Electro-Mechanical Systems (MEMS).A double exposure of SU-8 photoresist process was developed to create both the sensitive pool and reaction pool.Antibody was immobilized via cross-linking with glutaraldehyde on the sensitive area of the electrode surface,which was electropolymerized with polypyrrole previously.The immunosensor was characterized by detection of human immunoglobulin G (HIgG).The immunosensor displayed a good linear response to HIgG concentrations between 5ng/ml and 255ng/ml and demonstrated a fast response time of 3 minutes.
A micro amperometric immunosensor with the sensitive area of only 1mm ~ 2 was fabricated on silicon using the technique of Micro-Electro-Mechanical Systems (MEMS). A double exposure of SU-8 photoresist process was developed to create both the sensitive pool and reaction pool. Antibody was immobilized via cross-linking with glutaraldehyde on the sensitive area of the electrode surface, which was electropolymerized with polypyrrole previously. The immunosensor was characterized by detection of human immunoglobulin G (HIgG). The immunosensor displayed a good linear response to HIgG concentrations between 5 ng / ml and 255 ng / ml and demonstrated a fast response time of 3 minutes.