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室温下采用射频磁控溅射粉末靶,在玻璃基底上制备了掺铝氧化锌/银/掺铝氧化锌(AZO/Ag/AZO)三层透明导电薄膜。通过优化中间银层厚度,优化了三层透明导电薄膜的光电性能。采用原子力显微镜和X射线衍射仪分别对薄膜的形貌和结构进行检测分析;采用紫外可见分光光度计和霍尔效应仪分别对薄膜的光电性能进行检测分析。结果表明,所制备的三层膜表面平整,颗粒大小错落均称;三层膜呈现多晶结构,AZO层薄膜具有(002)择优取向的六方纤锌矿结构,Ag层薄膜具有(111)择优取向的立方结构;当三层薄膜为AZO(20 nm)/Ag(12 nm)/AZO(20 nm)时,在550 nm处的透光率为88%,方块电阻为4.3Ω/□,电阻率为2.2×10~(-5)Ω·cm,载流子浓度为2.8×1022/cm~3,迁移率为10 cm~2/(V·s),品质因子为3.5×10-2Ω~(-1)。
At room temperature, a three-layer transparent conductive film doped with aluminum oxide / silver / aluminum-doped zinc oxide (AZO / Ag / AZO) was prepared on a glass substrate by RF magnetron sputtering powder target. By optimizing the thickness of the intermediate silver layer, the optoelectronic properties of the three-layer transparent conductive film are optimized. Atomic force microscope and X-ray diffractometer were used to detect and analyze the morphology and structure of the films respectively. The optical and electrical properties of the films were detected by UV-visible spectrophotometer and Hall effect instrument respectively. The results show that the surface of the prepared three-layer film is smooth and the sizes of the particles are well distributed. The three-layer film has a polycrystalline structure. The AZO layer has a (002) preferred hexagonal wurtzite structure. The Ag layer has a (111) Oriented cubic structure; when the three-layer thin film is AZO (20 nm) / Ag (12 nm) / AZO (20 nm), the transmittance at 550 nm is 88%, the sheet resistance is 4.3 Ω / □, The rate of charge is 2.2 × 10 -5 Ω · cm, the carrier concentration is 2.8 × 102 2 / cm 3, the mobility is 10 cm -2 / (V · s), the quality factor is 3.5 × 10 -2 Ω ~ (-1).