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将通过能量为25keV、注量为6.24×1016/cm2的Ar+ 辐射处理后的三份西瓜种子接种在含有15mg / L镰刀菌酸(Fusaric acid,FA)的MS(Murashige, Skoog)培养基上获得无菌苗,以其子叶为外植体接种在MS+2mg/L 6-苄氨基嘌呤(Benzylaminopruine,BA)+15mg/L FA培养基上进行诱导生芽,将抗性再生芽转接到MS+0.2mg/L萘乙酸(Naphthylacetic acid,NAA)+15mg/L FA培养基上,进行抗FA的再生苗的生根诱导培养。结果表明,离子束辐射处理和FA对感病西瓜种子3-27和YH-5的发芽率及成苗都有显著抑制,两者的复合抑制作用更强;离子束辐射处理过的两个感病西瓜种子抗FA的芽诱导再生率和生根诱导率都高于对应的不经过离子束辐射处理的对照材料,提高幅度在材料之间、芽再生和根再生之间有差异。
Three watermelon seeds treated with Ar + radiation at a dose of 25 keV and a fluence of 6.24 × 10 16 / cm 2 were inoculated on MS (Murashige, Skoog) medium containing 15 mg / L Fusaric acid (FA) The aseptic seedlings were inoculated with cotyledons explants on MS + 2mg / L Benzylaminopruine (BA) + 15mg / L FA medium to induce shoots, and the resistant shoots were transferred to MS + 0.2mg / L Naphthylacetic acid (NAA) + 15mg / L FA medium. The results showed that ion beam radiation treatment and FA significantly inhibited the germination rate and seedling emergence of susceptible watermelon seeds 3-27 and YH-5, and their complex inhibition was stronger. The two sensitivities of ion beam radiation treatment The bud induction and rooting induction rates of diseased watermelon seeds against FA were both higher than those of the corresponding control materials without ion beam irradiation, with the magnitude of increase being different between materials, bud regeneration and root regeneration.