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本研究选择钽和钒的氮化物作为个体层材料,利用超高真空射频磁控溅射系统制备TaN、VN及一系列的TaN/VN多层薄膜。通过XRD,纳米力学测试系统分析了该体系合成中工作气压对多层膜结构与机械性能的影响。结果表明多层膜的纳米硬度值都高于两种个体材料混合相的硬度值;当工作气压为0.2Pa时,结晶出现多元化,多层膜体系的硬度、弹性模量、应力均达到最佳效果,最大硬度达到31GPa。多层膜的机械性能改善明显与工作气压的变化有直接的联系。证明了通过选择合适的工作气压条件,合成具有高硬度的纳米多层膜是可以实现的。
In this study, tantalum and vanadium nitrides were selected as the individual layer materials, and TaN, VN and a series of TaN / VN multilayer films were prepared by ultra-high vacuum RF magnetron sputtering system. The effects of working pressure on the structure and mechanical properties of the multilayer were analyzed by XRD and Nano-mechanical testing system. The results show that the multilayer nanocrystallinity values are higher than the hardness values of the two mixed materials. When the operating pressure is 0.2Pa, the crystallinity appears diversified, and the hardness, elastic modulus and stress of multilayer films reach the maximum Good effect, the maximum hardness of 31GPa. The improvement of the mechanical properties of multilayer films is directly related to the change of working pressure. It is proved that it is feasible to synthesize nano-multilayers with high hardness by selecting suitable working pressure conditions.