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综述了化学气相沉积法(CVD)、物理气相沉积法(PVD)和等离子体化学气相沉积法(PCVD)三类气相沉积技术制备高硅钢的工艺和路线,并对其前景进行了展望。
The technology and route of preparing high silicon steel by three types of vapor deposition techniques, chemical vapor deposition (CVD), physical vapor deposition (PVD) and plasma chemical vapor deposition (PCVD) are reviewed. The prospect of the high silicon steel is also discussed.