论文部分内容阅读
基于多层膜准单色覆盖50~1500 eV 能谱的多能点发射光谱测量系统可获得“聚龙一号”装置Z-pinch 等离子体 X 射线源的能谱结构和总能量等信息。考虑装置的条件，在13 nm 处的多层膜需要工作在掠入射角60°。常规的 Mo/Si 多层膜尽管反射率最高，但其带宽较大，不能满足多层膜准单色的要求。因此提出将 Mo 和 C 共同作为多层膜的吸收层材料与 Si 组成 Si/Mo/C 多层膜，可使反射率降低较小而带宽明显减小。采用磁控溅射方法制备了 Si/Mo/C 多层膜，其掠入射 X 射线反射测量表面多层膜的结构清晰完整，同步辐射工作条件下反射率测量，得到 Si/Mo/C 多层膜在13 nm 处和掠入射角60°时的反射率为56.5%，带宽为0.49 nm(3.7 eV)。“,”A multi-energy-point emission spectrum measurement system can be implemented on primary test stand (PTS) facility based on multilayer covering from 50 eV to 1 500 eV quasi monochromatically.The information of spectrum structure and total energy of this Z-pinch plasma X-ray radiation source can be obtained from this system.The multilayer working at 13 nm is required to operate under a grazing incidence angle of 60°given the facility condition.The highest reflectivity can be achieved by the conventional Mo/Si multilayer,but it will display a large bandwidth,which cannot satisfy the quasi-monochromatic require-ment for the multilayer.This paper proposes that taking Mo and C together as the absorbing materials to combine with Si to form Si/Mo/C multilayer,which can significantly reduce the bandwidth with a slight decrease of the reflectivity.This kind of Si/Mo/C multilayer was fabricated by direct current magnetron sputtering technique.The grazing incidence X-ray reflectivity (GIXR)has shown the multilayer with a clear and complete structure.The EUV reflectivity measurement at the synchrotron radiation light source has demonstrated this Si/Mo/C multilayer with a reflectivity of 56.5% and a bandwidth of 0.49 nm (3.7 eV).