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采用ｘ－ｒａｙ衍射、电子衍射、电子探针、二次离子质谱及俄歇电子能谱等分析方法研究了低能氮离子轰击对不锈钢基材上 ＨＣＤ离子镇 Ｔｉ膜层的组成，结构及界面状态的影响。结果表明，轰击后膜层的化学组成和结构以及界面状态均发生了较大变化．在较低的基体温度下，Ｎ元素就能够渗入 Ｔｉ膜层并与之反应形成 Ｔｉ、Ｎ或 ＴｉＮ相。在适当的轰击电压下，Ｎ元素能够渗入基体，促进界面反应生成 Ｆｅ２Ｔｉ或 ＦｅＴｉ界面相，可见。低能离子轰击对于激活化学反应，降低沉积温度并改善膜基界面结合强度是十分有益的。
The composition, structure and interfacial state of HCD ion-killed Ti film on stainless steel substrates were studied by X-ray diffraction, electron diffraction, electron probe, secondary ion mass spectrometry and Auger electron spectroscopy Impact. The results show that the chemical composition and structure of the film after bombardment and the interface state have undergone major changes. At a lower substrate temperature, the elemental N can penetrate into and react with the Ti film to form a Ti, N or TiN phase. Under appropriate bombardment voltage, N element can infiltrate the matrix and promote the interfacial reaction to form Fe2Ti or FeTi interface phase. Low-energy ion bombardment is very beneficial for activating chemical reactions, reducing the deposition temperature and improving the membrane-based interfacial bonding strength.