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采用在线化学气相沉积法在玻璃基片上制备FTO(SnO2:F)薄膜,并通过调整原料MBTC(C4H9SnCl3)的含量实现FTO薄膜的雾度可控。采用雾度计、分光光度计、X射线衍射仪、扫描电子显微镜、原子力显微镜和四探针方阻计研究了不同雾度的FTO薄膜的微观结构和光电性能,并分析了雾度形成的机理。研究表明:随着MBTC投放量的增加,薄膜的晶粒粒径增大,膜层表面粗糙度增大,膜厚增加,雾度随之增加,同时晶粒趋向于(200)面生长;另一方面,随着雾度增加,透过率有所下降,薄膜的雾度与透过率是一对矛盾关系,高雾度和高透过率难以同时实现。
FTO (SnO2: F) thin films were prepared on glass substrate by online chemical vapor deposition method, and the haze of FTO film was controlled by adjusting the content of raw material MBTC (C4H9SnCl3). The microstructure and photoelectric properties of FTO films with different haze were studied by using haze meter, spectrophotometer, X-ray diffraction, scanning electron microscopy, atomic force microscope and four-probe square resistance meter. The mechanism of haze formation was also analyzed . The results show that with the increase of MBTC dosage, the grain size of the film increases, the surface roughness of the film increases, the film thickness increases, and the haze increases. Meanwhile, the grains tend to grow on the (200) face. On the one hand, as the haze increases, the transmittance decreases, the haze and transmittance of the film are a contradiction, and the high haze and the high transmittance are hard to achieve at the same time.