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如何在镀膜过程中实行非λ/4膜系的厚度控制,目前已经成为大家所关心的问题。以往在镀制λ/4膜系时,用极值法控制膜层厚度比较普遍。这种方法操作简单,也具有一定的精度。沿用这种膜厚控制方式,来镀制非λ/4膜系,是有可能的。用极值法控制非λ/4膜系所要解决的问题,就是要对每层膜选择一个适当的控制波长,使得膜层逐渐沉积在控制基片上时,对这个波长的光的反射率正好在设计厚度上达到极值。我们编制了一个程序,用来寻找所要求的合适波长,并在各相应波长下,模拟了每层膜的镀膜过程(参见程序框图。由于反射率的计算已为大家所熟知,本程序中只将它作为一个过程,在框图中没有给出)。
How to control the thickness of non-λ / 4 film system in the coating process has now become a problem that everyone cares about. In the past in the plating system of λ / 4, the use of extreme value method to control the thickness of the film is more common. This method is simple, but also has some accuracy. With this film thickness control method, it is possible to plate a non-λ / 4 film system. The problem to be solved with the extreme value method for controlling non-λ / 4 film systems is to choose an appropriate control wavelength for each film so that when the film is gradually deposited on the control substrate, the reflectance of light of this wavelength is exactly Design thickness to reach the extreme. We have developed a program to find the right wavelength for the desired wavelength and to simulate the coating process for each layer at each wavelength (see the block diagram.) Since the calculation of the reflectivity is well known, only As a process, not shown in the block diagram).