用热蒸发沉积和自然氧化法制备纳米量级的Al/Al2O3及Cr/Cr2O3薄膜和多层膜。本文采用三点法测定了常温、低温下的U-I特性,发现常温、低温下纳米量级的Al/Al2O3及Cr/Cr2O3薄膜具有类似负阻的特性。SEM检测表明,薄膜表面均匀,薄膜的厚度和称重法所得的厚度基本相符。AFM和STM观察表明薄膜表面存在着岛状结构,表面粗糙度在纳米尺度范围内。 Preparation of nano-scale Al / Al2O3 and Cr / Cr2O3 thin films and multilayer films by thermal evaporation deposition and natural oxidation. The three-point method was used to determine the U-I characteristics at room temperature and low temperature. It was found that the Al / Al2O3 and Cr / Cr2O3 films at room temperature and low temperature have similar negative resistance characteristics. SEM test showed that the film surface is uniform, the thickness of the film and the thickness obtained by the weighing method basically match. AFM and STM observations show that there is island structure on the surface of the film, and the surface roughness is in the range of nanometer scale.