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提出了球面旋涂微米级厚度光刻胶膜层薄化率公式及径向位置演变公式,并得到了膜厚分布的演变公式。与平面涂胶相比,球面涂胶离心力及重力分量是在不断的变化。根据平面旋涂运动方程及球面面形特征,给出了球面旋涂运动方程;结合流体层流的表面条件及不可压缩流体的质量连续方程,推导出了膜厚h及径向位置r对时间t的演变公式,并得到了在径向位置r处初始厚度为h0的膜厚演变的数学模型。通过对模型参数的分析可知,球面旋涂光刻胶应采用主从轴偏心旋涂,旋涂时工件的开口应朝向侧面(旋转轴水平)。
The formula of thinning rate and radial position evolution of the spherical spin-on micrometer thickness photoresist layer are proposed, and the evolution formula of the film thickness distribution is obtained. Compared with the plane coating, spherical coating centrifugal force and gravity component is constantly changing. According to the plane spin-coating equation of motion and the spherical surface feature, the spherical spin-coating motion equation is given. Combining the surface conditions of fluid laminar flow and the mass continuity equation of incompressible fluid, the relationship between film thickness h and radial position r t and the mathematical model of the film thickness evolution with initial thickness h0 at radial position r is obtained. Through the analysis of the model parameters, we can see that the spherical spin-on photoresist should adopt the eccentric spin-coating of the master-slave, and the opening of the workpiece should be turned to the side (the rotation axis is horizontal) when the spin-coating is applied.