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To optimize the existing slurry for abrasive-free polishing(AFP)of hard disk substrate,a water-soluble free radical initiator,2,2-azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride(AIBI)is introduced to the H2O2-based slurry.The polishing results show that,the material removal rate(MRR)of hard disk substrate polished with H2O2-based slurry containing AIBI is obviously higher than that without AIBI.The acting mechanism of the improved MRR is investigated.Electron paramagnetic resonances tests show that,by comparison with H2O2 slurry,H2O2-AIBI slurry provides higher concentration of hydroxyl radicals.Auger electron spectrometer analyses further demonstrate that the oxidation ability of H2O2-AIBI slurry is much greater than H2O2 slurry.In addition,potentiodynamic polarization tests show that the corrosion dissolution rate of hard disk substrate in H2O2-AIBI slurry is increased.Therefore that stronger oxidation ability and a higher corrosion dissolution rate of H2O2-AIBI slurry lead to higher MRR can be concluded.
To optimize the existing slurry for abrasive-free polishing (AFP) of hard disk substrate, a water-soluble free radical initiator, 2,2-azobis [2- (2- imidazolin-2- yl) propane] dihydrochloride introduced to the H2O2-based slurry. The polishing results show that the material removal rate (MRR) of hard disk substrate polished with H2O2-based slurry containing AIBI is obviously higher than that without AIBI. The acting mechanism of the improved MRR is investigated . Electron paramagnetic resonances tests show that, by comparison with H2O2 slurry, H2O2-AIBI slurry provides higher concentration of hydroxyl radicals. Auger electron spectrometer analyzes demonstrate that the oxidation ability of H2O2-AIBI slurry is much greater than H2O2 slurry. potentiodynamic polarization tests show that the corrosion dissolution rate of hard disk substrate in H2O2-AIBI slurry is increased. wherefore that stronger oxidation ability and a higher corrosion dissolution rate of H2O2-AIBI slurry lead to hi gher MRR can be concluded.