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我们研究了石英晶体的各种抛光和清洁处理技术。使用透射电子显微镜研究抛光晶体的表面结构,今辨度达到15。在以不同抛光技术制作的晶体本之间,可见表面质量的差别很大。本文介绍直到目前为止可以制作无缺陷最佳表面的抛光工艺。利用高能电子绕射研究了晶面特征。观测了确切定义的菊池线(Kikuchi),可以看出,如果表面有破坏层,其厚度小于100。使用奥格电子频谱掌研究了以过氧化氢为基础的清洁处理程序的效果。在使用该程序之后,在表面所能观测到的杂质只是少许单层碳。借助离子轰击清洁处理能够产生原子纯洁的石英表面,但是离子轰击本身产生某些不需要的副作用。本文讨论了电子束和离子束轰击的数应。旨在确定最佳抛光工艺和最佳离子轰击清洁处理方法的研究,还在继续进行。
We studied a variety of quartz crystal polishing and cleaning technology. Using transmission electron microscopy polishing the surface structure of the crystal, now reach 15 degrees. In the different polishing techniques produced between the crystal, the surface quality can be seen very different. This article describes the polishing process that until now has made it possible to create the perfect surface without defects. The crystal plane characteristics have been studied by high energy electron diffraction. A well-defined Kikuchi line was observed, and it can be seen that the thickness is less than 100 if the surface is damaged. The effect of a hydrogen peroxide-based cleaning procedure was investigated using Ogg’s Electronic Spectrum Hand. After using this program, only a few monolayers of carbon are observed on the surface. Ion bombardment cleaning can produce an atomically pure quartz surface, but ion bombardment itself produces some unwanted side effects. This article discusses the electron beam and ion beam bombardment of the number should be. Research aimed at determining the best polishing process and the best ion bombardment cleaning process continues.