通常,半导体器件制造中制版工艺的分步重复照相都是在高分辨率乳胶版上进行的。然后以此为原版进行复印来制造光刻掩模版。若大批量生产某品种的掩模,则先从原版上印得“母版”,再从“母版”上印制工作掩模。可以想像经过这样两次复印,掩模的缺陷会有所增加,精度也会下降。显然,缩短工艺流程,减少复印次数是提高工作掩模质量十分重要的措施。那么,直接在匀胶铬版上分步重复“母版”或工作掩模将是比较理想的。 根据我们多年的试验,这种分步重复照相可以用负性光致抗蚀剂,也可以用正性光致抗蚀剂来实现,而获得图形的边缘以后者为好。用这种方法制得的“母版”或工作掩模因为是铬版或氧化铬版,其耐磨性较乳胶版要好得 In general, step-and-repeat photography of a plate-making process in the manufacture of semiconductor devices is performed on a high-resolution emulsion plate. Then use this as the original copy to create a photolithographic reticle. If a variety of masks are mass produced, the master is first printed on the master, and then the working mask is printed on the master. It can be imagined that after such two copies, the defects of the mask will increase and the accuracy will decrease. Obviously, to shorten the process, reduce the number of copies is to improve the quality of work masks is a very important measure. Then, it would be ideal to repeat the “masters” or working masks directly on the homogenized chrome plate. Based on our years of experimentation, this step-and-repeat photography can be done with a negative photoresist or with a positive photoresist, but getting the edges of the pattern is better. The “masters” or working masks made in this way have better wear resistance than the latex version because they are chrome or chrome