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本文介绍了分步重复投影光刻机的i线和g线投影光刻物镜主要技术指标、设计要点、研制中解决的关键单元技术和设计试制结果。结果表明数值孔径NA＝0．42i线和NA＝0．45g线、视场15×15mm以及畸变＜±0．1μm的五倍缩小投影光刻物镜研制成功。
This paper introduces the main technical indexes, design points, the key unit technology and the trial design results of i-line and g-line projection lithography objective lens in step-and-repeat projection lithography. The results show that the numerical aperture NA = 0.42i line and NA = 0.45g line, the field of view 15 × 15mm and distortion <± 0.1μm five times reduction projection lithography objective successfully developed.