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本文介绍一种应用镓(Ga)或金(Au)液态金属离子源的刻蚀离子枪。该枪由轴针型、长寿命液态金属离子源和显象管的三圆筒 Einzel 透镜及-对静电偏转型偏转系统组成。结构简单而紧凑,产生离子束时,真空系统无需充入惰性气体,可以产生束能1～5kV、束流1×10~(-6)A～1×10~(-8)A 的 Ga~+或 Au~+离子束。束斑大小在500μm～5mm 范围内可调,既可作大面积均匀刻蚀,也可作小束斑局部刻蚀或扫描刻蚀。采用多孔钨作为液态金属料池,贮料多、在高温下不与工作物质产生化学反应,因而束流稳定性可以达到±1.7%/3小时。
This article describes an ion beam gun that uses gallium (Ga) or gold (Au) liquid metal ion sources. The gun consists of a three-barrel Einzel lens with a pin-type, long-life liquid metal ion source and kinescope, and an electrostatic deflection deflection system. The structure is simple and compact, and when the ion beam is generated, the vacuum system can generate Ga ~ (1+) ions with a beam energy of 1~5 kV and a beam current of 1 × 10 -6 -6 A to 1 × 10 -8, + Or Au ~ + ion beam. Beam spot size adjustable in the range of 500μm ~ 5mm, both for large area uniform etching, but also for small beam spot etching or scanning etching. Porous tungsten is used as the liquid metal material pool, which stores more material and does not react with the working substance at high temperature, so the beam stability can reach ± 1.7% / 3 hours.