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TiO_2具有较高的折射率,在光学方面有着广泛的应用。文中采用等离子辅助反应电子束真空蒸镀法,以 Ti 为膜料、纯度为99.99%的 O_2为反应气体,在玻璃衬底上制备了 TiO_2薄膜。使用 XRD、OM、SEM 分别对50℃、150℃、300℃三个不同沉积温度下制备的薄膜及其经过450℃真空退火1h 后的结构进行了分析,并对薄膜的折射率进行测量。实验结果表明,提高沉积温度可以增加成膜原子的能量及其在衬底上的扩散能力,使沉积的薄膜结构平整致密,具有较高的折射率。
TiO 2 has a high refractive index and has a wide range of applications in optics. In this paper, plasma-assisted electron beam vacuum deposition was used to prepare TiO 2 thin films on glass substrate with Ti as material and O 2 with 99.99% purity as reaction gas. The films prepared at three different deposition temperatures (50 ℃, 150 ℃ and 300 ℃) and their structures after vacuum annealing at 450 ℃ for 1h were analyzed by XRD, OM and SEM. The refractive index of the films was measured. The experimental results show that increasing the deposition temperature can increase the energy of the film-forming atoms and their diffusion ability on the substrate, so that the deposited film structure is smooth and dense with a high refractive index.