美国麻省理工学院林肯实验室 H.I.Smith 等人发展了一种在无定形材料衬底上生长定向晶体硅薄膜的工艺,据弥这将是制造太阳电池和集成电路的革命性方法,世界上第一次在不是单晶的衬底上生长了单晶硅。这项新技术被称为图像外延(graphoepitaxy)。 HIT Smith, Massachusetts Institute of Technology, Lincoln Laboratory, has developed a process for growing oriented crystalline silicon thin films on amorphous substrates, which is a revolutionary way of making solar cells and integrated circuits. Monocrystalline silicon grown on a substrate that is not single crystal at a time. This new technique is called graphoepitaxy.