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利用紫外光刻和反应离子刻蚀技术在石英衬底上制备二维亚波长结构的压印模板,并对模板进行表面修饰。研究了主要刻蚀工艺参数对刻蚀速率及刻蚀形貌的影响。增加工作气压,刻蚀速率先增大到最大值,然后下降;增加射频功率可以提高刻蚀速率,但功率过大会导致刻蚀产物发生二次沉积;延长刻蚀时间可以增加刻蚀深度,但时间过长会发生过刻蚀现象。在优化的刻蚀工艺条件下制备出了较为理想的亚波长石英模板。经表面修饰后,模板表面与水的接触角增大,有效克服了压印胶的粘连,并在ZnS衬底上压印出了良好的二维亚波长结构图形。
Two-dimensional subwavelength imprinting template was prepared on quartz substrate by UV lithography and reactive ion etching, and the template was surface modified. The effects of the main etching parameters on the etching rate and etching morphology were studied. Increase the working pressure, the etching rate first increased to the maximum, and then decreased; increase the RF power can increase the etching rate, but the power is too large lead to the second deposition of the product; extend the etching time can increase the depth of etching, but Excessive etching occurs. The optimized sub-wavelength quartz template was prepared under the optimized etching conditions. After the surface modification, the contact angle of the template surface with water is increased, which effectively overcomes the adhesion of the embossed adhesive and imparts a good two-dimensional subwavelength structure pattern on the ZnS substrate.