采用控电位沉积方式在ｐ型Ｓｉ上制备了Ｎｉ－Ｐｄ合金薄膜；考察了合金的阴极沉积和阳极溶出行为；研究了极化方式对膜组成、厚度、结构及形貌的影响．结果表明，在沉积初期，膜主要以层状方式生长，当膜增厚或阴极极化增强时，则以岛状形式生长．Ｘ射线衍射测试表明，Ｎｉ－Ｐｄ合金呈面心立方结构，其晶面间距随合金组成不同而变化． Ni-Pd alloy thin films were prepared on p-type Si by controlled potential deposition. The cathodic deposition and anodic dissolution behavior of the alloy were investigated. The effects of polarization on the composition, thickness, structure and morphology of the films were investigated. The results show that in the initial stage of deposition, the film mainly grows in a layered manner, and grows in an island form when the film is thicken or the cathode polarization is enhanced. X-ray diffraction tests show that the Ni-Pd alloy has a face-centered cubic structure, and the interplanar spacing varies with the alloy composition.