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将电弧离子镀和中频非平衡磁控溅射工艺相结合制备了Ti1-xAlxN薄膜。利用扫描电镜、能谱仪、X射线衍射仪、显微硬度计、划痕仪、摩擦磨损仪等分析检测仪器研究了不同Al含量Ti1-xAlxN薄膜的性能。结果表明:随Al含量增加,沉积速率变大;各种Al含量的膜层中都有Ti1-xAlxN相;当x为51at.%时薄膜有最高的显微硬度2741.8HV,此时摩擦系数达到最低值0.14;Al含量多时膜层Ti1-xAlxN表面粗糙;各种Al含量的膜层与基体的结合力大致相同,临界载荷都在16～20N左右。
Ti1-xAlxN thin films were prepared by a combination of arc ion plating and IF unbalance magnetron sputtering. The properties of Ti-xAlxN films with different Al contents were investigated by using scanning electron microscopy, energy dispersive spectroscopy, X-ray diffraction, microhardness tester, scratch tester and friction tester. The results show that the deposition rate increases with the increase of Al content. Ti1-xAlxN phase is present in all Al films. When x is 51at.%, The film has the highest microhardness of 2741.8HV, and the friction coefficient reaches The lowest value is 0.14; the surface of Ti1-xAlxN film is rough when the content of Al is high; the bonding strength of Al film with matrix is almost the same, and the critical load is about 16 ~ 20N.