索尼开发０．１８μｍ工艺的光刻技术索尼公司已开发出用于０．１８μｍ工艺的光刻技术。近几年来数字化及多功能设备对大规模、高密度器件及专用集成电路（ＡＳＩＣ）单个芯片的需求大大增加，这就使得光刻技术转向短波长曝光光源，光源也由ｉ线转向准分子激光，同时倾斜... Sony develops 0.18μm process lithography Sony has developed a lithography technology for 0.18μm process. The demand for large-scale, high-density devices and single chips for application specific integrated circuits (ASICs) has increased dramatically in recent years with digital and multi-function devices, which has led to the shift of lithography to short-wavelength exposure light sources, which also turn from i-line to excimer laser , While tilting ...