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目前,在制造半导体器件和集成电路时,为确定光致抗蚀剂材料上的图象而使用的掩模,主要有两种。一种是照像的玻璃乳胶版,另一种是铬膜玻璃版。两种版都有缺点。乳胶版容易产生划痕和难于洁净。其尺寸易受湿气吸收的影响。玻璃铬版不存在这些缺点,但有其他问题。如果基片也象镜面那样光亮,铬版与原先图形完全相符可能就困难。金属版高的反射性能容易增加产生量光效应的机会,造成曝光后抗蚀剂的分辨率的损失。此外,制备无针孔的金属薄膜也是困难的。
Currently, there are mainly two types of masks used to determine the image on a photoresist material in the manufacture of semiconductor devices and integrated circuits. One is a photographic glass latex version, the other is a chrome-glass version. Both versions have shortcomings. Latex version easy to scratch and difficult to clean. Its size is susceptible to moisture absorption. Glass chrome plate does not have these shortcomings, but there are other problems. If the substrate is as bright as a mirror, it may be difficult for the chrome plate to exactly match the original one. The high reflection of the metal plate tends to increase the chances of producing a light effect, resulting in a loss of resolution of the resist after exposure. In addition, it is also difficult to produce a pinhole-less metal film.