论文部分内容阅读
提出一种分析微波等离子体化学气相沉积工艺条件对金刚石薄膜的组成和光学性质影响的方法。采用红外椭圆偏振光谱仪来分析Si衬底上金刚石薄膜的组成和光学性质 ,研究微波等离子体化学气相沉积法生长条件和退火工艺对金刚石薄膜的消光系数和折射率的影响。实验表明金刚石薄膜中存在C -H、C =C、O -H和C =O键 ,生长条件对薄膜中C -H和C =C键的含量及薄膜的折射率影响较大 ;薄膜经过退火后薄膜的光学性质得到明显改善。
A method to analyze the influence of microwave plasma chemical vapor deposition process conditions on the composition and optical properties of diamond films was proposed. The composition and optical properties of diamond films on Si substrates were analyzed by infrared ellipsometer. The effects of growth conditions and annealing process on the extinction coefficient and refractive index of diamond films were studied. The results show that there are C-H, C = C, O-H and C = O bonds in the diamond film. The growth conditions have a great effect on the content of C-H and C = C bonds and the refractive index of the films. The optical properties of the back film have been significantly improved.