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以低硅钢片为基底(Fe-3%质量比Si),采用双靶直流共焦溅射不同叠加结构的硅-铁多层膜系(Fe-Si),然后在高真空下热扩散处理2 h得到高硅钢。研究了交替沉积、叠加周期性结构多层膜对热处理扩散硅含量的影响。用X射线衍射对样品进行物相分析,得出不同硅铁合金相(Fe-Si)的形成强烈依赖于前期膜沉积结构,周期性交替沉积Fe、Si膜时更有利于形成硅铁B2、DO_3相结构。用扫描电镜及能量散射谱观察了样品的断面微观形貌并测定硅含量沿断面深度分布关系,发现硅含量始终在断面中心低、两边高,且不同叠加结构膜系下的样品硅含量也不一样,选择合适的Fe、Si交替沉积膜系有利于硅的扩散。分别测量了不同叠加结构膜系下样品的电阻率、密度、断面显微硬度值,结果显示硅含量越高电阻率约大、硬度越高、密度越小。
Based on the low silicon steel sheet (Fe-3% mass ratio Si), double-target direct current confocal sputtering was used to fabricate Si-Fe multilayer films with different superposition structures (Fe-Si) h get high silicon steel. The effects of alternating deposition and stacking of periodic structure multilayer films on the heat treatment of diffused silicon were investigated. The phase analysis of the samples by X-ray diffraction showed that the formation of different ferrosilicon alloy phase (Fe-Si) was strongly dependent on the pre-film deposition structure, and the formation of ferrosilicon B2, DO_3 Phase structure. Scanning electron microscopy (SEM) and energy dispersive spectroscopy (SEM) were used to observe the microstructure of the samples and determine the distribution of silicon content along the fracture surface. The results show that the silicon content is always low at the center of the fracture surface and high on both sides. Similarly, the choice of appropriate Fe, Si deposited film is conducive to the proliferation of silicon. The resistivity, density and cross-section microhardness of the samples with different superposed structures were measured respectively. The results showed that the higher the silicon content, the higher the resistivity, the higher the hardness and the lower the density.