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采用碳酰胺高温分解产生含C、O、N源与氢化锆原位反应制备阻氢渗透层,借助俄歇电子能谱(AES)和X射线光电子能谱(XPS)等手段对阻氢渗透层元素成分及深度、键态进行分析。AES结果表明:氢化锆表面原位反应层由C、N、O、Zr元素组成,随溅射时间增加,O、Zr元素含量增加,C、N元素含量降低。原位反应层厚度约3.4μm,其中含N、C层深度约150 nm。氢化锆表面阻氢渗透层XPS分析表明,表面层存在ZrO_2,同时有Zr-OH、Zr-N、C-H、N-H键。氢在扩散过程中被C、O、N捕获表明含C、O、N的氢化锆表面原位反应层对氢的渗透有一定的阻碍作用。
Hydrogen permeation layer was prepared by the in situ reaction of C, O, N source and zirconium hydride with pyrolysis of carbamide, and the hydrogen permeation layer was prepared by Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) Element composition and depth, key state analysis. The results of AES show that the surface reaction layer of zirconium hydride is composed of C, N, O and Zr elements. With the increase of sputtering time, the contents of O and Zr increase and the contents of C and N decrease. In situ reaction layer thickness of about 3.4μm, which contains N, C layer depth of about 150 nm. The results of XPS analysis showed that there were ZrO 2 in the surface layer and Zr-OH, Zr-N, C-H and N-H bonds. Hydrogen capture by C, O, N during diffusion shows that the in situ reaction layer on the surface of the zirconium hydride containing C, O, N hinders hydrogen permeation.