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由于薄膜生长均匀、沉积速率和膜厚易控、可制备大面积薄膜等特点,电子束沉积技术在超导薄膜、多层巨磁阻薄膜、超晶格薄膜中得到了深入研究。电子束沉积技术的关键是其薄膜生长和控制系统。本文基于微型计算机DA和IEEE488接口技术,报道了一种全自动超高真空电子束蒸发薄膜生长系统,自动化程度高,使用方便,名义薄膜厚度测量分辨率可达0.1A。精度,可实现双源共蒸发功能和程序预设定的多源多层薄膜自动沉积。
Due to the uniform growth of the film, the deposition rate and the easy control of the film thickness, a large area film can be prepared. The electron beam deposition technology has been further studied in superconducting films, multi-layer giant magnetoresistive films and superlattice films. The key to electron beam deposition is its thin film growth and control system. Based on microcomputer DA and IEEE488 interface technology, this paper reports a fully automatic ultra-high vacuum electron beam evaporation film growth system with high degree of automation and easy to use. The nominal film thickness measurement resolution is up to 0.1A. Accuracy, dual-source co-evaporation function can be achieved and the program pre-set automatically deposited multi-source multi-layer film.