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洁净的壁条件和良好的真空环境是托克马克装置运行的基本条件,但是真空室暴露大气后会在器壁表面吸附大量的杂质,如何快速恢复良好的真空环境以及壁条件是关系到托克马克运行效率和成本的一个关键问题。本文深入分析了EAST 2015年夏季实验期间真空室两次暴露大气后的壁处理对真空条件的恢复,结果显示水汽是真空室暴露大气后的主要杂质成分,直流辉光和离子回旋放电清洗与第一壁200℃烘烤同时进行能够有效地恢复真空。研究结果还发现暴露大气前的第一壁涂层处理会增强杂质的吸附,需要更长时间的壁处理才能够恢复较好的真空条件。
Clean wall condition and good vacuum environment are the basic conditions for the operation of Tokemark unit. However, when the vacuum chamber is exposed to the atmosphere, a large amount of impurities are adsorbed on the wall surface of the vessel. How to quickly recover the good vacuum environment and the wall conditions are related to the toc Mark a key issue of operational efficiency and cost. This paper analyzes in depth the recovery of the vacuum condition of the wall after vacuum exposure to the atmosphere in the EAST 2015 summer experiment. The results show that the water vapor is the main impurity component of the vacuum chamber after exposure to the atmosphere. The DC glow and ion cyclotron discharge cleaning, A 200 ℃ baking at the same time can effectively restore the vacuum. The study also found that the first wall coating prior to exposure to the atmosphere enhanced the adsorption of impurities and required longer wall treatments to restore better vacuum conditions.