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使用配备有ＥＤＳ和ＥＣＰ附件的ＳＥＭ、ＡＥＭ和ＳＴＭ研究了在７５０和８００℃的Ｚｒ（Ｙ）Ｏ２衬底上磁控溅射沉积的大面积ＹＢＣＯ超导薄膜的表面组织状态。ＹＢＣＯ薄膜为ｃ轴取向单晶，但衬底温度为８００℃时，膜表面的突出组织多为ＣｕＯ颗粒，小坑较多，表面粗糙；衬底温度为７５０℃时，突出组织多为棒状和多边形１２３结构，很少小坑，表面较平整。对不同衬底温度下膜的生长机制和小坑的形成机制进行了讨论。
The surface texture of a large area YBCO superconducting thin film deposited by magnetron sputtering on Zr (Y) O2 substrates at 750 and 800 ° C was investigated using SEM, AEM and STM equipped with EDS and ECP accessories. YBCO films are c-axis oriented single crystals. However, when the substrate temperature is 800 ℃, the protruding structures on the film surface are mostly CuO particles with more pits and surface roughness. When the substrate temperature is 750 ℃, the protruding structures are mostly rod- Polygon 123 structure, little pits, the surface is relatively flat. The growth mechanism of the film and the formation of pits at different substrate temperatures are discussed.