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恒温水套是光刻物镜工作环境温度控制系统的重要组成部分。为了研究恒温水套的关键参数与性能,设计了一个小比例水套模型。恒温温控系统对其提供±0.001℃的去离子水,通过对比三镜光机系统温度变化及热像差变化获取小比例水套的关键参数。实验数据表明,在加入热扰动且环境温度为22.06~22.16℃的情况下,三镜光机系统的内壁温度被控制在(22±0.01)℃以内,波像差在热扰动后迅速恢复至10.12nm,与装调完毕状态基本一致。由此可见,此种水套结构可以满足光刻投影物镜的温度控制要求,可在此基础上设计等比例恒温水套模型。
Constant temperature water jacket is lithography objective temperature control system is an important part of the system. In order to study the key parameters and performance of thermostatic water jacket, a small-scale water jacket model was designed. Thermostat temperature control system to provide ± 0.001 ℃ deionized water, by comparing the three-mirror system changes in temperature and thermal aberrations to obtain a small percentage of the key parameters of the water jacket. Experimental data show that under the condition of heat disturbance and ambient temperature of 22.06 ~ 22.16 ℃, the temperature of the inner wall of the three-mirror system is controlled within (22 ± 0.01) ° C, and the wavefront aberration quickly returns to 10.12 after thermal disturbance nm, and installed state is basically the same. Thus, this water jacket structure can meet the lithography projection objective temperature control requirements can be based on the design of constant proportion water jacket model.