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采用激光全息光刻技术或激光直写技术制作微结构具有便捷、灵活、高效等优势,目前已成为研究制备光子晶体的一种有效方法。用全息光刻技术所制备的微结构的特点是单晶面积大(即内部结构缺陷较少)和可根据需要制作研究多种周期或准周期的晶格结构。但是所制备的结构由于感光树脂与空气的折射率比值较低,不能得到完全带隙光子晶体,从而使其应用受到局限性。以此树脂结构为模板,通过各种方法对其进行二次加工,制作高介电常数材料的反结构,近期已成为研究热点。本文介绍了气相沉积技术在制备高折射率光子晶体方面的应用和研究进展。
The fabrication of microstructures by laser holographic lithography or laser direct writing is convenient, flexible and efficient, and has become an effective method to study the preparation of photonic crystals. Microstructures made with holographic lithography are characterized by a large single crystal area (ie, fewer internal structural defects) and the possibility to fabricate multiple periodic or quasi-periodic lattice structures as needed. However, due to the low refractive index ratio of the photosensitive resin to air, the prepared structure can not obtain a complete bandgap photonic crystal, so its application is limited. Using this resin structure as a template, secondary processing by various methods to fabricate the inverse structure of a high dielectric constant material has recently become a research hotspot. This article describes the application of vapor deposition technology in the preparation of high refractive index photonic crystals and research progress.