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抗蚀剂曝光的模拟与光刻系统空间像模拟紧密相连 ,一般是用标量衍射方法在特殊几何形状的光源分布和特殊掩摸结构的条件下计算的 ,实质是一定边界条件和初始条件下 Maxwell方程组的求解。驻波是曝光中的寄生效应 ,是光线垂直入射到不同的平行平面介质层之间 ,经多次反射并干涉形成的。驻波的边界条件是平行界面上电磁场矢理的连续。在这种条件下对驻波的描述有 BERNING的多层光学薄膜模型和 MACK的膜层递推解析模型。本文用传统的光学传输矩阵模型来描述 ,建立了简洁有效的迭代算法 ,分析了该算法的收敛性 ,并编制出相应的计算程序 ,给出了计算结果
The simulation of resist exposure is closely related to the space image simulation of the lithography system and is usually calculated by the scalar diffraction method under the conditions of light source distribution and special mask structure of special geometric shapes. The boundary condition and the initial conditions Maxwell Solution of equations. The standing wave is a parasitic effect in exposure, which is formed by multiple light reflection and interference caused by the light rays being incident perpendicularly to different parallel plane dielectric layers. The boundary condition of the standing wave is the continuity of the electromagnetic field vector in the parallel interface. The description of the standing wave under such conditions includes BERNING’s multilayer optical thin film model and MACK’s reticular reticulation model. In this paper, the traditional optical transfer matrix model is used to describe and establish a concise and effective iterative algorithm. The convergence of the algorithm is analyzed and a corresponding calculation program is compiled. The calculation results are given