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Ｘ－ｒａｙ光刻（ＸＲＬ）是微／纳米光刻技术中至关重要的批量复制技术，ＸＲＬ的发展在于不断对Ｘ－ｒａｙ源、新型的ｓｔｅｐｐｅｒ、Ｘ线掩模版以及相关处理工艺的研究进展。其中，Ｘ线掩模版不仅直接关系到ＸＲＬ的分辨率水平，也极大地影响其使用效率及其费用。我们在此报道一种采用云母薄片作为载片的新型Ｘ－ｒａｙ掩模版，其载片厚为８μｍ，自支撑能力、平直光滑度等几方面都符合高分辨率光刻的要求。基此采用新的工艺可大大简化制作步骤，降低造价，并可在０．５－１．５ｎｍ波长范围内的Ｘ－ｒａｙ光刻中获得实际成功的应用。
X-ray lithography (XRL) is a critical mass-replication technique for micro / nano lithography. The development of XRL is the continuous research progress of X-ray sources, new stepper, X-ray reticle and related processing technologies . Among them, the X-ray mask is not only directly related to the XRL resolution level, but also greatly affect the efficiency and cost of its use. Here we report a new X-ray reticle with mica flake as a slide, which has a slide thickness of 8 μm and meets the requirements of high-resolution lithography in terms of self-supporting ability and smoothness. Based on this new process can greatly simplify the manufacturing steps, reduce the cost, and in the 0.5-1.5nm wavelength range of X-ray lithography in the practical success of the application.