铌酸锂脊形波导最近引起了广泛研究兴趣,它通常采用刻蚀钛扩散或质子交换铌酸锂条形波导或平板波导的方法制作而成。对由这两种方法制备的钛扩散铌酸锂脊形波导在1550nm波长处的横电基模光场分布进行了仿真分析。结果指出,当钛扩散条件相同时,通过刻蚀钛扩散铌酸锂平板波导得到的脊形结构在横向和纵向上对导模均具有更好的束缚能力。这种脊形波导的制作工艺相对简单,它对导模的强束缚有利于减小铌酸锂电光调制器尺寸和提高光电重叠积分因子。实验制备了钛扩散铌酸锂平板波导,并基于微机电系统(MEMS)工艺在其表面制作出Cr膜马赫-曾德尔干涉计(MZI)阵列图案,然后在SF6气氛中对平板波导进行反应离子刻蚀,初步得到了铌酸锂脊形波导MZI阵列。扫描电镜分析结果显示制得的脊形波导横截面呈梯形状,两侧面较粗糙,脊高约670nm。 Lithium niobate ridge waveguides have attracted much interest recently and are usually fabricated by etching titanium or proton-exchanged lithium niobate strip or slab waveguides. The transverse electric mode light field distribution of the Ti-doped lithium niobate ridge waveguide prepared by these two methods at 1550 nm wavelength was simulated and analyzed. The results indicate that the ridge structure obtained by etching titanium diffused lithium niobate slab waveguide has better binding ability both in the transverse direction and in the longitudinal direction when the diffusion conditions of titanium are the same. The fabrication process of the ridge waveguide is relatively simple. Its strong restraint on the guide mode helps to reduce the size of the lithium niobate electro-optic modulator and increase the integral factor of the photoelectric overlap. The Ti-doped lithium niobate slab waveguide was experimentally fabricated and the Cr film Mach-Zehnder interferometer (MZI) array pattern was fabricated on its surface based on the micro-electromechanical system (MEMS) process. Then, the plate waveguide was subjected to reactive ion Etching, a preliminary lithium niobate ridge waveguide MZI array. Scanning electron microscopy results show that the resulting ridge waveguide has a trapezoidal cross-section, both sides of the rough, ridge height of about 670nm.