追溯美国在低压气相合成金刚石研究的历史,早在50年代初即高压高温合成金刚石成功之前就已有过使用低压气相法获得金刚石的报导以及60—70年仍有这方面研究的文章及专利报告。但进展甚微,未能引起人们的重视,直至1986年宾州州立大学材料研究实验室R.Messier研究小组用微波等离子体CVD方法,获得良好结晶形态的金刚石薄膜,引起了美国 Tracing back to the history of low-pressure vapor-phase synthetic diamond research in the United States, low-pressure gas-phase diamond production has been reported as early as the early 1950s when high-temperature and high-temperature synthetic diamond was successful, as well as articles and patent reports on this aspect in 60-70 years . But little progress, failed to arouse people’s attention until 1986 Pennsylvania State Materials Research Laboratory R. Messier research team using microwave plasma CVD method to obtain a good crystalline morphology of the diamond film, causing the United States