本文以DSW系统为重点,介绍了国外几种集成电路光学曝光设备的近期发展情况;预测了它们的未来。并根据较新资料对过去几年和未来几年的光刻市场情况作了归纳和预测。 In this paper, DSW system as the focus, introduced several recent developments in the world of integrated circuit optical exposure equipment; forecast their future. Based on the newer information, the market situation of lithography in the past few years and the coming few years has been summarized and predicted.