Improvement of Film Thickness Uniformity in Meniscus Coating

来源 :The 4th Advances in Optoelectronics and Micro/nano-optics (A | 被引量 : 0次 | 上传用户:xltmzzd
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  In order to realize the uniform coating of photoresist on large area substrates,which could hardly been attained by other methods like spin coat-ing,a slotted meniscus coating applicator has been designed and assembled in this paper.During the coating process,the photoresist is continuously andslowly pumped out through a long and narrow slot like a fountain in the shape of meniscus.
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