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以镀有Mo过渡层的Al2O3衬底,在微波等离子体增强化学气相沉积(MPCVD)系统中,制备了非晶碳/Mo2C混合结构薄膜,反应气体为CH4和H2。在高真空室中测量了样品场发射特性。开启场强为0.55V/μm,在1.8V/μm电场下样品的发射电流密度为6.8mA/cm2。发射点点密度>103/cm2。用 SEM观察了表面形貌,Raman和XRD谱分析了薄膜的微观结构和成分。实验结果表明该薄膜是一种好的场致电子发射体。
In the microwave plasma enhanced chemical vapor deposition (MPCVD) system, an amorphous carbon / Mo2C mixed structure thin film was prepared by using Al2O3 substrate with Mo interlayers. The reaction gases were CH4 and H2. The sample field emission characteristics were measured in a high vacuum chamber. The field intensity is 0.55V / μm, and the emission current density of the sample is 6.8mA / cm2 at 1.8V / μm. Launch dot density> 103 / cm2. The surface morphology was observed by SEM. The microstructure and composition of the films were analyzed by Raman and XRD. The experimental results show that the film is a good field-induced electron emitters.