By means of sputtering a nanocrystalline NdFeB film was deposited on silicon substrates,and the microstructure and magnetic performance of the films were characterized by X-ray diffraction(XRD),atomic force microscope(AFM)and vibrating sample magnetometer(VSM).Results show that the films have a similar composition to the target and contain a single phase Nd33Fe60B3.The films were composed by particles contained a number of 30-50nm crystal grains.The coercivity,remanence and energy product of the films all reduced with the increase of the deposition time.